Find us on Facebook Follow us on Twitter





























Pass4sure 920-345 exam VCE are accessible at killexams.com store | brain dumps | 3D Visualization

Download Killexams.com 920-345 examcollection - Prepare our Killexams.com 920-345 Questions and Answers and exam prep and you will pass 920-345 exam4sure - brain dumps - 3D Visualization

Pass4sure 920-345 dumps | Killexams.com 920-345 existent questions | http://morganstudioonline.com/

920-345 BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration

Study guide Prepared by Killexams.com Nortel Dumps Experts

Exam Questions Updated On :


Killexams.com 920-345 Dumps and existent Questions

100% existent Questions - Exam Pass Guarantee with elevated Marks - Just Memorize the Answers



920-345 exam Dumps Source : BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration

Test Code : 920-345
Test cognomen : BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration
Vendor cognomen : Nortel
: 110 existent Questions

No hassle! 24 hrs practise of 920-345 exam is required.
A score of 86% was past my covet noting total the questions inside due time I got around 90% questions practically equivalent to the killexams.com dumps. My preparation was most noticeably vitiate with the intricate themes I was hunting down some solid simple materials for the exam 920-345. I began perusing the Dumps and killexams.com repaired my issues.


test out these existent 920-345 questions and solemnize help.
When I had taken the determination for going to the exam then I got a kindly champion for my preparation from the killexams.com which gave me the realness and reliable practice 920-345 prep classes for the same. Here, I besides got the occasion to salvage myself checked before passion confident of performing well in the way of the preparing for 920-345 and that was a nice thing which made me flawless ready for the exam which I scored well. Thanks to such things from the killexams.


actual Q & A brand new 920-345 examination are awesome!
Excellent 920-345 stuff, 920-345 valid questions, 920-345 reform answers. Professional exam simulator. I was relieved to notice that this preparation pack has necessary information, just what I needed to know to pass this exam. I despise when they try to sell you stuff you dont exigency in the first place. This wasnt the case though, I got exactly what I needed, and this is proven by the fact that I passed this 920-345 exam last week, with a nearly flawless score. With this exam experience, killexams.com has gained my dependence for years to come.


much less attempt, grotesque understanding, guaranteed success.
i am very jubilant right now. You ought to subsist questioning why im so glad, rightly the purpose is quite easy, I just got my 920-345 test results and i beget made it through them quite without problems. I write over here because it become this killexams.com that taught me for 920-345 check and i cant fade on with out thanking it for being so generous and helpful to me at some point of.


actual test questions of 920-345 examination! high-quality source.
The very vintage of killexams.com is elevated adequate to abet the applicants in 920-345 exam education. total the products that I had used for 920-345 exam coaching had been of the exceptional top class in order that they assisted me to smooth the 920-345 exam quick.


What study guide execute I exigency to prepare to pass 920-345 exam?
I scored 88% marks. A decent confederate of mine recommended the utilization of killexams.com Questions & solutions, due to the fact she had likewise passed her exam in view of them. total of the material turned into super first-class. Getting enlisted for the 920-345 exam changed into simple, but then came the troublesome element. I had a few alternatives, both enlists for commonplace instructions and surrenders my low protection profession, or test on my own and proceed with the employment.


splendid source! I were given actual test questions of 920-345 exam.
This is the best test-prep on the market! I just took and passed my 920-345. Only one question was unseen in the exam. The information that comes with the QA get this product far more than a brain-dump, for coupled with traditional studies; online exam simulator is an extremely valuable implement in advancing ones career.


Great source of imposing 920-345 brain dumps, accurate answers.
This exam instruction package covered the questions i was asked at the exam - a few thing I didnt subsist given as existent with might subsist viable. So the stuff they provide is in fact valid. It appears to subsist often updated to holdup with the professional updates made to 920-345 exam. Superb first-class, the attempting out engine runs effortlessly and can subsist very consumer pleasant. there is not anything I dont relish approximately it.


try out these existent 920-345 actual test questions.
I efficaciously comprehended the difficult theme matters relish transport Competence and content material learning effectsfrom killexams. I correctly marks 90% marks. total credits to killexams.com. I was seeking out a reference guidewhich helped me in making plans for the 920-345 exam. My occupied calendar virtually permitted me to more time of twohours through the utilize of one approach or any other. Thru reserving and identifying to shop for the killexams.com Questions/solutionsand exam simulaotr, I had been given it at my entryway assignment internal one week and began planning.


high-quality to pay attention that dumps modern 920-345 exam are to subsist had.
I organized the 920-345 exam with the abet of killexams.com Nortel check preparation material. It changed into complicated but common very useful in passing my 920-345 exam.


Nortel BCM50/450 Rls. 5.0 Installation

latest Nortel utility unencumber offers SMBs New stages of Simplicity and Unified Communications | killexams.com existent Questions and Pass4sure dumps

typical application flux offers finished, most economical, and Scalable retort throughout structures and into branch workplaces

TORONTO, ONTARIO--(Marketwire - Nov. three, 2009) - little and medium-sized groups (SMBs) can obtain productivity, cost-reductions and the investment coverage essential to success in cutting-edge company ambiance with new unified communications-based mostly (UC) utility from Nortel* (OTCBB:NRTLQ). The latest software unlock 5.0 for Nortel's award-profitable enterprise Communications supervisor (BCM) adds new UC capabilities, together with unified presence, and stronger simplicity with the introduction of a typical application fling for BCM50 and BCM450.

The Nortel BCM450 and BCM50 are Linux-primarily based IP/TDM PBXs supplying software-wealthy, all-in-one options for converged voice and records communications. The BCM50 serves businesses with as much as 50 clients while the higher skill BCM450 is suitable for becoming medium to gigantic organizations and branch places of travail with up to 300 clients. every supports a mingle of IP and digital purchasers and can enable enterprises to retailer up to 70 % of their common funding by reusing current device.

As section of the new BCM Rls 5.0 application, BCM450 and BCM50 supply SMBs with dynamic UC points relish InTouch, which delivers ethical federated presence, and widely wide-spread integrated communications purposes and capabilities. InTouch lets clients talk with no pains with anybody of their own directory – throughout Microsoft Outlook, Nortel BCM, MSN, and Skype for click on-to-name, click on-to-IM, and click on-to-e mail. via connecting americans quicker, improving collaboration and speeding up the time to determination, Nortel estimates that unified communications can abet companies recognise charge-discount rates and an expand in productiveness of up to 18 %.

closing yr, the Nashville convention and guests Bureau** (NCVB) leveraged its BCM450 retort to ebook more than 650,000 lodge rooms while marketing tourism on behalf of quite a few partners. NCVB is now trialing BCM Rls 5.0 and plans to roll out the InTouch software within the coming weeks. Kay Hopwood, NCVB's director of counsel expertise, is anticipating seeing precise-time presence for everybody on the network and having a view into overlooked calls even when a caller doesn't leave a voicemail. For now, NCVB is enjoying the first BCM Rls 5.0 feature it deployed, FindMe/FollowMe (FMFM), which enables simultaneous ringing of up to five additional exterior contraptions. "every muster is potential company," mentioned Hopwood. "With BCM's FindMe/FollowMe ability, their income crew under no circumstances has to omit a different earnings-producing muster once again."

Minitel**, a premier Nortel associate featuring provider across Canada, besides chose to ordeal BCM Rls 5.0 in its personal workplace creation device. Its Toronto vice president of Operations, Dan Silverman, turned into so jubilant with the evolution of the in-residence ordeal he convinced a gigantic accounting enterprise customer to installation it as well. "The installation became as clean as can subsist and the client is now rolling out both InTouch and FindMe/FollowMe to numerous clients of their corporation with no trouble. They had been in a position to salvage their client up to accelerate on the interface and rolling the application out with the aid of themselves in less than an hour," mentioned Silverman.

Mexico's Universidad Latinoamericana** (ULA) similarly verified the latest BCM application with positive results. "we're in the enterprise of teaching concurrent formative years and making ready them for the future and the challenges forward," spoke of Mario Ahumada Sandoval, subdirector of programs, ULA. "To execute so, they signify number on having the newest in communications expertise that helps us proffer a prosperous UC journey for team of workers and college students. Trialling BCM Rls 5.0, they organize that the product's new characteristic set enhances their UC event, while maximizing materiel already in region."

BCM50 consumer, Philkeram-Johnson**, the oldest ceramic tile producer in Greece, besides welcomed the brand new application liberate. "Our Nortel BCM50 gives us scope to develop, when it comes to potential and performance, and it provides the elements they exigency to evolve to a unified communications ambiance," stated Christos Syropoulos, commercial manager, Philkeram-Johnson. "we are constantly in search of methods to boost their items and their productiveness in order to reply more straight away to valued clientele. i am desperate to find out more about the new facets attainable in BCM Rls 5.0 and how they can utilize them to enhance their communications."

in addition to the InTouch and FMFM capabilities, BCM Rls 5.0 lets a person forward a voice message the utilize of a file in order that it may besides subsist performed or study by means of any cellular materiel on this planet. Meet-Me Conferencing for BCM now provides up to one hundred twenty five ports with champion for as many as 300 users. skilled cognomen Recording, a ability customarily presented via a 3rd party is besides attainable as a section of the latest BCM free up.

As an extra capability of streamlining expenses and operations making it even more essential for SMBs and Nortel channel companions to installation, provision, and migrate pre-current facts, the brand new BCM50 and BCM450 portfolio comprises yardstick software and purposes, O/S, working towards, accreditation, consumer interfaces, and documentation.

Dell'Oro ranks Nortel's SMB portfolio #1 on the earth in number of hybrid-IP lines shipped and #2 in SMB market earnings for the 2nd quarter 2009. Nortel's BCM options are localized and sold in over one hundred twenty nations via greater than a thousand channels.

Hear from greater BCM users and partners:

  • "FindMe/FollowMe and Message Forwarding permit constitution Telecom's** revenue and technical group of workers to subsist greater attainable to their shoppers, even if within the workplace or on the highway. With the ability for individual users to personalize these points to their liking via an internet-primarily based GUI device Mailbox supervisor. Their gadget administrator now not has to get each day changes. FMFM and the skill to seamlessly switch calls between their desk phones and mobile phones has besides allowed us to lower their charges, deliver their group of workers with greater flexibility, and boost their availability to consumers." – David Harper, voice techniques engineer, constitution Telecom - Canada
  • "Our office communications were primarily based solely on Nortel's BCM methods for years. They currently upgraded to the latest BCM know-how, preserving most of their preliminary funding in hardware and total the funding in utility licenses. the brand new UC performance increases their productivity and saves time. It besides allows us to connect to other programs relish Communications Server 1000 and Microsoft OCS. With InTouch they are in a position to maneuver their online contacts at MSN and Skype from a lone software interface in MS Outlook, together with their workplace colleagues, shoppers, and companions." – Nikos Koulioumbis, SMB options director, UniNortel SA** - Greece
  • "inventive new facets corresponding to InTouch with federated presence, FindMe/FollowMe, professional cognomen Recording and superior CTI applications are total extremely kindly productiveness enhancers so that it will deliver groups time and money and this basically resonated with the consumers they talked to at a recent seminar held in Nortel's Maidenhead workplace. They had enthusiastic feedback from attendees together with a London-primarily based voice and records options issuer who said he most loved the component of the seminar that concentrated on BCM Rls 5.0." – Thomas Jacques, managing director, 1st Communications** - UK
  • "The BCM product has always been one that they now beget been proud to present to their shoppers because of its converged voice and information solution for little and medium companies. As a longtime channel confederate of Nortel's in Mexico, they leer ahead to being able to present these very aspects, apart from newly better ones with the brand new utility free up of BCM Rls 5.0 with new points akin to FindMeFollowMe, expert muster Recording, and more desirable CTI functions with a purpose to expand their consumer's productiveness." – Jorge Alberto Jimenez Hernandez, director of engineering, Innovaciones Telemáticas, S.A. de C.V.** (INTELEMATICA) - Mexico
  • About Nortel

    Nortel grants communications capabilities that get the engage of enterprise Made primary a truth for their purchasers. Their next-generation technologies, for each provider company and trade networks, abet multimedia and company-important applications. Nortel's applied sciences are designed to assist dispose of today's barriers to efficiency, pace and efficiency by using simplifying networks and connecting people to the information they want, when they want it. For more information, discuss with Nortel on the net at www.nortel.com. For the newest Nortel news, visit www.nortel.com/news.

    certain statements in this press unencumber might besides comprise words equivalent to "could", "expects", "might also", "anticipates", "believes", "intends", "estimates", "aims", "envisions", "seeks" and different similar language and are regarded forward-looking statements or tips under material securities legislations. These statements are in keeping with Nortel's present expectations, estimates, forecasts and projections about the operating ambiance, economies and markets through which Nortel operates. These statements are sphere to vital assumptions, risks and uncertainties, which can subsist tricky to prophesy and the precise outcome may well subsist materially distinctive from these contemplated in ahead-searching statements. For more information with esteem to inevitable of those and other elements, perceive Nortel's Annual document on Form10-okay, Quarterly studies on benevolent 10-Q and different securities filings with the SEC. until otherwise required by way of applicable securities laws, Nortel disclaims any end or responsibility to update or revise any forward-looking statements, no matter if on account of new tips, future movements or in any other case.

    *Nortel, the Nortel logo and the Globemark are logos of Nortel Networks.

    **here is a 3rd party hyperlink as described in their internet linking practices.

    Use of the terms "accomplice" and "partnership" does not imply a prison partnership between Nortel and any other celebration.


    Nortel adds UC Capabilities to enterprise Communications supervisor | killexams.com existent Questions and Pass4sure dumps

    First identify: remaining name: e mail tackle: Password: ascertain Password: Username:

    Title: C-degree/President supervisor VP staff (associate/Analyst/etc.) Director

    characteristic:

    function in IT resolution-making process: Align enterprise & IT desires Create IT approach determine IT wants maneuver vendor Relationships consider/Specify brands or carriers different position empower Purchases now not worried

    Work telephone: business: company size: trade: road address metropolis: Zip/postal code State/Province: country:

    occasionally, they ship subscribers particular presents from elect partners. Would you relish to receive these special companion presents by the utilize of e-mail? confident No

    Your registration with Eweek will encompass here free electronic mail newsletter(s): news & Views

    with the aid of submitting your wireless number, you settle that eWEEK, its linked homes, and supplier companions presenting content you view might besides contact you the utilize of contact center know-how. Your consent isn't required to view content material or utilize site points.

    via clicking on the "Register" button beneath, I disagree that I actually beget cautiously examine the phrases of carrier and the privacy policy and that i comply with subsist legally confident through total such terms.

    Register

    continue without consent      

    Unquestionably it is arduous assignment to pick dependable certification questions/answers assets regarding review, reputation and validity since individuals salvage sham because of picking incorrectly benefit. Killexams.com ensure to serve its customers best to its assets concerning exam dumps update and validity. The vast majority of other's sham report dissension customers further to us for the brain dumps and pass their exams joyfully and effortlessly. They never trade off on their review, reputation and trait on the grounds that killexams review, killexams reputation and killexams customer certitude is imperative to us. Uniquely they deal with killexams.com review, killexams.com reputation, killexams.com sham report objection, killexams.com trust, killexams.com validity, killexams.com report and killexams.com scam. On the off casual that you perceive any unfounded report posted by their rivals with the cognomen killexams sham report grievance web, killexams.com sham report, killexams.com scam, killexams.com protest or something relish this, simply recall there are constantly impoverished individuals harming reputation of kindly administrations because of their advantages. There are a huge number of fulfilled clients that pass their exams utilizing killexams.com brain dumps, killexams PDF questions, killexams hone questions, killexams exam simulator. Visit Killexams.com, their specimen questions and test brain dumps, their exam simulator and you will realize that killexams.com is the best brain dumps site.

    Back to Braindumps Menu


    000-208 braindumps | 000-839 free pdf | 600-210 brain dumps | 000-259 existent questions | HP0-D09 braindumps | 132-S-100 practice exam | 00M-642 practice test | CMAA braindumps | HP3-X05 pdf download | C8060-220 questions answers | EN0-001 mock exam | 1Z0-871 dumps | GE0-803 practice Test | 250-101 test prep | C2180-404 test prep | 000-818 exam prep | 250-308 existent questions | OMG-OCUP-100 study guide | MB2-228 practice questions | 70-705 practice test |


    Pass4sure 920-345 Dumps and practice Tests with existent Questions
    We are doing battle to giving you actual BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration exam questions and answers, alongside explanations. Each on killexams.com has been confirmed by Nortel certified specialists. They are exceptionally qualified and confirmed people, who beget numerous times of expert suffer identified with the Nortel exams.

    The best thanks to salvage success within the Nortel 920-345 exam is that you just got to salvage dependable dumps. they beget an approach to guarantee that killexams.com is the most direct pathway towards Nortel BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration test. you will succeed with full surety. you will subsist able to perceive free questions at killexams.com before you salvage the 920-345 exam dumps. Their exam questions are as similar as actual exam questions. The Questions and Answers collected by the certified professionals. they appoint you the expertise of taking the essential exam. 100% guarantee to pass the 920-345 existent exam. killexams.com Discount Coupons and Promo Codes are as under; WC2017 : 60% Discount Coupon for total exams on website PROF17 : 10% Discount Coupon for Orders larger than $69 DEAL17 : 15% Discount Coupon for Orders larger than $99 SEPSPECIAL : 10% Special Discount Coupon for total Orders Click http://killexams.com/pass4sure/exam-detail/920-345

    killexams.com beget their experts Team to guarantee their Nortel 920-345 exam questions are dependably the most current. They are at the entire extraordinarily confidential with the exams and testing consciousness.

    How killexams.com maintain Nortel 920-345 exams updated?: they beget their uncommon procedures to realize the maximum recent exams statistics on Nortel 920-345. Now after which they feel their accomplices who're especially at ease with the exam simulator recognition or once in a while their customers will email us the latest enter, or they were given the most current update from their dumps carriers. When they learn the Nortel 920-345 exams changed then they updates them ASAP.

    On the off prep that you honestly further up quick this 920-345 BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration and might elect no longer to sit tense for the updates then they will give you full refund. however, you should ship your score retort to us with the goal that they will beget a exam. They will give you full refund quick amid their working time when they salvage the Nortel 920-345 score document from you.

    Nortel 920-345 BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration Product Demo?: they beget both PDF model and Testing Software. You can exam their product web page to perceive what it would appear that like.

    At the point when will I salvage my 920-345 cloth once I pay?: Generally, After successful payment, your username/password are sent at your e mail cope with within 5 min. It may besides prefer puny longer in case your answers postpone in permeate authorization.

    killexams.com Huge Discount Coupons and Promo Codes are as underneath;
    WC2017 : 60% Discount Coupon for total tests on website
    PROF17 : 10% Discount Coupon for Orders extra than $69
    DEAL17 : 15% Discount Coupon for Orders extra than $ninety nine
    DECSPECIAL : 10% Special Discount Coupon for total Orders


    920-345 Practice Test | 920-345 examcollection | 920-345 VCE | 920-345 study guide | 920-345 practice exam | 920-345 cram


    Killexams 000-637 practice test | Killexams C2170-051 test prep | Killexams A2180-376 practice test | Killexams HP0-P21 existent questions | Killexams LX0-104 bootcamp | Killexams 190-722 exam prep | Killexams HP2-Z27 dumps questions | Killexams 9A0-064 questions and answers | Killexams 250-512 braindumps | Killexams 000-271 exam questions | Killexams 000-M31 cheat sheets | Killexams JN0-522 braindumps | Killexams 920-345 cram | Killexams 3202 free pdf download | Killexams 920-548 test questions | Killexams 000-575 test prep | Killexams JN0-102 brain dumps | Killexams HP0-262 study guide | Killexams HP2-K10 sample test | Killexams 000-730 questions answers |


    killexams.com huge List of Exam Braindumps

    View Complete list of Killexams.com Brain dumps


    Killexams NET practice test | Killexams M2020-733 brain dumps | Killexams HP0-S15 practice Test | Killexams M2090-743 braindumps | Killexams IQ0-100 questions answers | Killexams CABA questions and answers | Killexams P2065-035 practice exam | Killexams 70-357 practice test | Killexams BI0-112 test prep | Killexams 000-123 dumps questions | Killexams 1T6-303 cram | Killexams VCS-319 VCE | Killexams 642-979 practice test | Killexams HP2-K25 practice questions | Killexams 1Z0-400 mock exam | Killexams 920-254 braindumps | Killexams E20-357 existent questions | Killexams HP0-S21 practice questions | Killexams 1Z0-453 dumps | Killexams PW0-200 existent questions |


    BCM50/450 Rls. 5.0 Installation and(R) Initial Configuration

    Pass 4 confident 920-345 dumps | Killexams.com 920-345 existent questions | http://morganstudioonline.com/

    Atomic-level insight into super-efficient electrocatalytic oxygen evolution on iron and vanadium co-doped nickel (oxy)hydroxide | killexams.com existent questions and Pass4sure dumps

    Fabrication and characterization of Ni3Fe1−xVx

    A sequence of Ni3Fe1−xVx (oxy)hydroxide catalysts (0 ≤ x ≤ 1), namely Ni3Fe, Ni3V, Ni3Fe0.67V0.33, Ni3Fe0.5V0.5, Ni3Fe0.33V0.67, and sheer Ni (oxy)hydroxides were directly grown on hydrophilic CFPs by hydrothermal synthesis (Fig. 1 and Supplementary Fig. 1). The atomic ratios of different metals in the as-prepared catalysts were determined by analyses of inductively coupled plasma optical emission spectroscopy (ICP-OES, Supplementary Table 1).

    Fig. 1

    Fabrication of Ni3Fe1‒xVx/CFP O2-evolving electrodes. Schematic illustration of the fabrication procedure by directly growing Ni3Fe1‒xVx NSs on a pretreated CFP substrate

    The powder X-ray diffraction (PXRD) patterns (Supplementary Fig. 2) bespeak that Ni3Fe1−xVx are isostructural to α-Ni(OH)2 (JCPDS Card No. 38-0715). The reflections at 2θ = 11.4° and 22.7°, corresponding to the (003) and (006) lattice planes of Ni3Fe1−xVx, slightly shift to larger 2θ values by 0.2° and 0.6°, respectively, relative to those of α-Ni(OH)2. The d-spacing values obtained from the (003) and (006) reflections are about 7.65 and 3.81 Å, respectively, with a little contraction compared to those for sheer α-Ni(OH)2 (d(003) = 7.79 Å and d(006) = 3.91 Å), which is most possibly caused by the substitution of Fe and V atoms for Ni in the lattice sites of the Ni(OH)2 matrix32,39,40. Because no extra diffraction peaks are observed in the PXRD pattern, it could subsist deduced that no separated crystalline phases, such as unary Ni-, Fe-, or V-based oxides/(oxy)hydroxides, are formed during the doping process12,28,41.

    Scanning electron microscopic (SEM) images of Ni3Fe0.5V0.5/CFP (Fig. 2a) clearly demonstrate that the entire surface of each carbon fiber is uniformly coated with the densely interlaced NSs, forming a acute contrast to the smooth surface of pristine carbon fibers (Supplementary Fig. 3). A nearby inspection (Fig. 2b) reveals that the interlaced NSs form a porous network structure. Such an open nanoarchitecture built by Ni3Fe0.5V0.5 ultrathin NSs would afford a mass of electrochemically dynamic sites, an effortless penetration of electrolyte, and a kindly mechanical strength, so as to help the OER activity and stability of the electrodes4. The quantitative SEM energy dispersive X-ray spectrum (SEM-EDX) of Ni3Fe0.5V0.5/CFP discloses the presence of Ni, Fe, V, and O elements with a Ni/Fe/V atomic ratio of 74.12:12.83:13.05, which is nearby to the stoichiometric metal ratio of Ni/Fe/V = 3:0.5:0.5. Moreover, the corresponding elemental mappings (Supplementary Fig. 4) illustrate that the Ni, Fe, V, and O elements dispense homogenously on the surface of carbon fibers.

    Fig. 2

    Microscopy measurements of Ni3Fe0.5V0.5 NSs. a, b Top-view SEM images of the carbon fiber coated with Ni3Fe0.5V0.5 NSs with low (a) and elevated (b) magnification. Scale bars, 1 μm in a and 100 nm in b. The inset in a shows the hierarchically structured 3D integrated electrode. Scale bar in the inset in a, 5 μm. c, d TEM images of Ni3Fe0.5V0.5 NSs scratched off from the as-prepared CFP electrode. Scale bars, 100 nm in c and 40 nm in d.e Atomic-resolution BF-TEM image of Ni3Fe0.5V0.5 NSs. Scale bar, 1 nm. f Aberration-corrected HAADF-STEM image of Ni3Fe0.5V0.5 NSs, the corresponding EDX elemental mappings of Ni, Fe, V, O and the mixed elemental mapping of Ni, Fe, V, and O. Scale bar, 2 nm

    The bright-field TEM (BF-TEM) image (Fig. 2c) of Ni3Fe0.5V0.5 NSs illustrates a rippled sheet structure with a dimension around 500 nm, and the lateral TEM image (Fig. 2d) shows the ultrathin Ni3Fe0.5V0.5 NSs with the thickness of 2.7–4.2 nm. Furthermore, the atomic-resolution BF-TEM image (Fig. 2e) displays transparent lattice fringes with an interplanar spacing of 2.67 Å, indexed to the (101) plane of Ni3Fe0.5V0.5 NSs. The interplanar spacing of lattice fringes is slightly smaller than that of α-Ni(OH)2 (2.68 Å) due to the doping of Fe and V for Ni in Ni(OH)2 lattices. lone atoms, clusters, and little particles of Fe and V species are not observed in aberration-corrected high-angle annular dark-field scanning TEM (HAADF-STEM) images of Ni3Fe0.5V0.5 NSs (Supplementary Fig. 5). Meanwhile, both the EDX elemental mappings and linear scanning analysis of the HAADF-STEM image of Ni3Fe0.5V0.5 NSs with sub-nanometer resolution (Fig. 2f and Supplementary Fig. 6) provide direct-viewing evidence for the uniform distribution of Ni, Fe, V, and O elements in the as-prepared NSs.

    In order to clarify the occupation sites of Fe and V dopants in Ni(OH)2 lattices, they parade in Fig. 3 the FT curves of the Fe and V K-edge EXAFS k2χ(k) functions for Ni3Fe, Ni3V, and Ni3Fe0.5V0.5. As references, their Ni K-edge FT curves are besides plotted (Fig. 3a). The FT curves of the Fe K-edge data of Ni3Fe and Ni3Fe0.5V0.5 exhibit two prominent coordination peaks at 1.5 and 2.7 Å that are identical to those of their Ni K-edge data (Fig. 3b), suggesting the substitutional doping of Fe in the Ni(OH)2 host. Similarly, the FT curves of Ni3V and Ni3Fe0.5V0.5 each parade a prominent V–O peak at 1.4 Å and a V–M (M = Fe, Ni, or V) peak at about 2.8 Å (Fig. 3c), and the high-shell peak of Ni3Fe0.5V0.5 is weaker than that of Ni3V. The significant abate in the intensity of the V–M coordination peak in the FT curve of Ni3Fe0.5V0.5 is most likely caused by the highly distorted local structure of V substituting for the site of Ni. To confirm the substitution of V for Ni in Ni(OH)2 lattices, the WT analysis of the V K-edge data was performed. A maximum at the cross point of R = 2.8 Å and k = 7.8 Å−1 appears in the EXAFS WT map at the V K-edge for Ni3Fe0.5V0.5 (Supplementary Fig. 7), just relish that for Ni3V. This implies the presence of V–Fe/Ni scatterings at a distance of around 2.8 Å surrounding V atoms and affords direct evidence for the substitution of V atoms for the Ni sites in Ni(OH)2 lattices. They besides made the calculation of the EXAFS spectra by assuming V adsorption on the Ni–Fe LDH layer or occupying the interstitial position. It turns out that in both cases the calculated spectra are quite different from the experimental V K-edge EXAFS spectra of Ni3Fe0.5V0.5 (Supplementary Fig. 8). Furthermore, DFT calculations insinuate that V atoms initially placed on the top site of surface Ni or O atoms are relaxed to the interstitial between two LDH layers after structure optimization. The LDH structure with interstitial doping is noticeably buckled, with formation energy of −3.73 eV per V atom, less stable with admiration to LDH with substitutional doping (−5.07 eV per V atom) (Supplementary Figs. 9, 10), supporting that V atoms occupy Ni positions in Ni(OH)2 lattices rather than the interstitial or top positions of LDH layers. On the other side, from Supplementary Fig. 11, the nearest-neighbor FT peak position of V is shifted to the lower-R side and the second coordination peak to higher-R side with apparently reduced intensity as compared to that of Fe. This implies the remarkable different local environment of the substitutional V from that of Fe in Ni3Fe0.5V0.5. The quantitative parameters extracted from EXAFS curve-fitting (Supplementary Figs. 12‒14 and Supplementary Tables 2‒4) further demonstrate that the bond length of V–O (1.72 Å) is significantly contracted with admiration to those of Fe–O (2.00 Å) and Ni–O (2.03 Å).

    Fig. 3

    XAS spectra of the as-prepared Ni-based (oxy)hydroxide catalysts. FT curves of a Ni K-edge, b Fe K-edge, and c V K-edge EXAFS k2χ(k) functions

    Understanding the electronic interaction in Ni3Fe1−xVx

    The electronic states of Fe and V in catalysts were investigated by ex-situ arduous X-ray absorption near-edge spectroscopy (XANES). Generally, in XANES spectra the intensity of the pre-edge peak depends predominantly on central site symmetry, while the absorption edge position is correlated to the oxidation status of central sites42. The absorption edges of Ni3Fe, Ni3V, and Ni3Fe0.5V0.5 in the XANES curves of Ni K-edge (Supplementary Fig. 15a) are total alike to that of the original Ni(OH)2, indicative of nearly identical indifferent oxidation states of Ni in the catalysts. Similarly, the XANES curves of Fe K-edge in Supplementary Fig. 15b demonstrate that the adsorption edges of Fe for Ni3Fe, Ni3Fe0.5V0.5, and Fe2O3 reference are almost overlapped, manifesting that the indifferent valence states of Fe are nearby to +3 in the as-prepared catalysts. Importantly, the V K-edge XANES spectra of Ni3V and Ni3Fe0.5V0.5 exhibit violent pre-edge peaks (Supplementary Fig. 15c), indicating the distorted coordination environment around V atoms in these materials42. More interestingly, Ni3Fe0.5V0.5 shows a higher pre-edge peak than that of Ni3V in the V K-edge XANES, implying a higher degree of octahedral geometry distortion at the V sites in Ni3Fe0.5V0.5 compared to those in Ni3V. Additionally, the K-edge absorption positions of Ni3V and Ni3Fe0.5V0.5 are more nearby to those of VO2 and V2O5 than to that of V2O3 (inset of Supplementary Fig. 15c), suggesting that the majority of V ions are in the formal valences of +4 and +5 in both catalysts.

    The as-prepared Ni3Fe1−xVx films were further studied by XPS and ex-situ soft XAS to gain an insight into the electronic interaction between Fe/V dopants and Ni atoms at the surface of catalysts. For Ni3Fe0.5V0.5 NSs, the Ni 2p spectrum (Fig. 4a) exhibits two fitting peaks at 872.3 and 854.4 eV along with two shakeup satellites at 878.4 and 860.1 eV, which are characteristic spin-orbit peaks of Ni2+ (refs. 13,28,43). In the Fe 2p region (Fig. 4b), Fe 2p1/2 and Fe 2p3/2 peaks arise at 724.8 and 711.5 eV, indicative of Fe in the +3 oxidation status (refs. 16,29). The V 2p3/2 peak (Fig. 4c) can subsist deconvoluted into three peaks located at 516.2 eV (V5+), 515.1 eV (V4+), and 514.4 eV (V3+) (refs. 26,28,29), demonstrating that the V atoms are predominantly in elevated oxidation states (+4 and +5) in Ni3Fe0.5V0.5, together with a minority of V3+, which is consistent with the results obtained from V K-edge XANES spectra.

    Fig. 4

    High-resolution XPS and XANES spectra of the as-prepared Ni-based (oxy)hydroxide catalysts. XP spectra of a Ni 2p for Ni3Fe0.5V0.5, Ni3Fe, Ni3V, and sheer Ni (oxy)hydroxides, b Fe 2p for Ni3Fe and Ni3Fe0.5V0.5, and c V 2p for Ni3V and Ni3Fe0.5V0.5 (the dashed lines shown in a–c bespeak the shifts of BEs  of 3d metal ions caused by the hybridization of Fe or/and V dopants). d–f Ni, Fe, and V L-edge XANES spectra. g Schematic representations of the electronic coupling among Ni, Fe, and V in Ni3Fe, Ni3V, and Ni3Fe0.5V0.5

    It is worthy of note that the Ni 2p BEs for the Fe or/and V doped binary and ternary materials are shifted apparently to higher BEs compared to those of sheer Ni (oxy)hydroxide, with the shift extent in an increasing order of Ni3Fe < Ni3V < Ni3Fe0.5V0.5 (Fig. 4a, Supplementary Fig. 16a, and Supplementary Table 5). In contrast, the V 2p peaks for Ni3V are shifted to lower BEs relative to the corresponding peaks for VO2 (ref. 44), and Ni3Fe0.5V0.5 displays V 2p3/2 peaks at BEs ~0.2 eV lower than those of Ni3V (Fig. 4c and Supplementary Fig. 16c). Of particular interest is that the BEs of Fe 2p1/2 and 2p3/2 for Ni3Fe are lower than those for Fe2O3 (ref. 45), but when half amount of Fe in Ni3Fe is replaced by V, Ni3Fe0.5V0.5 exhibits Fe 2p peaks at BEs not only considerably higher than those of Ni3Fe but besides higher than Fe2O3 (Fig. 4b and Supplementary Fig. 16b), implying that the Fe dopant acts as an electron accepting site in Ni3Fe but an electron donating site in an integrated effect when V is co-doped with Fe into Ni(OH)2 lattices. These observations insinuate the partial electron transfer from Ni to Fe or V in the bimetal (oxy)hydroxides through oxygen bridges (O2−) between metal ions, and from Ni and Fe to V in Ni3Fe0.5V0.5, which is in kindly agreement with the calculated Mulliken charges for V, Fe, and Ni ions in Ni3Fe1−xVx (Supplementary Table 6).

    These speculations are further supported by the Ni, Fe, and V L-edge XANES spectra shown in Fig. 4d‒f. Figure 4d illustrates that doping Fe or V could intensify the Ni L3-edge peak (852.5 eV), indicative of partial electron transfer from Ni to the substitutional Fe or V. The intensity of the Fe L3-edge peak at 709.8 eV for Ni3Fe is besides enhanced when V is doped into Ni3Fe (Fig. 4e). On the contrary, the V L3-edge peak (518.3 eV) of Ni3Fe0.5V0.5 is considerably weakened and shows a red-shift, as compared with that of Ni3V (Fig. 4f). The comparative analyses of XPS and XANES spectra insinuate that co-doping of Fe together with V into Ni(OH)2 lattices results in more electron transfer to the V in Ni3Fe0.5V0.5 compared to that in Ni3V (Fig. 4c, f and Supplementary Fig. 16c). The stalwart interaction among these 3d metal ions results in synergistic modulation of the electronic structure of the metal centers of Fe/V co-doped Ni(OH)2 (refs. 12,22,36,43), and the concerted effect of Ni, Fe, and V metals with different energy levels of d-band centers could get crucial contribution to the evident enhancement of OER activity of hybridized materials. Moreover, they calculated the branching ratio, L3/(L2 + L3), at the Fe L-edges of Ni3Fe and Ni3Fe0.5V0.5, which is approximately 0.74, implying the high-spin of Fe3+ (ref. 46). And they besides calculated the Fe L2,3-edge XAS for the high-spin and low-spin models of Fe3+ (Supplementary Note 1 and Supplementary Methods). Obviously, the calculated high-spin L2,3-edge XAS could well yield the experimental data (Supplementary Fig. 17), affording more evidence for the high-spin configuration of Fe3+ substituting the Ni sites. Thus, the valence electronic configurations of Ni2+, Fe3+, V4+, and V5+ are 3d8 (t2g6eg2), 3d5 (t2g3eg2), 3d1 (t2g1eg0), and 3d0 (t2g0eg0), respectively, which are adopted in the following analysis of valence electron structures of metal ions in Ni3Fe, Ni3V, and Ni3Fe0.5V0.5.

    The synergistically electronic interplay of Ni, Fe, and V cations in Ni3Fe0.5V0.5 is well explained in light of the analysis of valence electron structures of metal ions. In term of the result obtained from DFT calculations that the (Ni3Fe0.5V0.5)-OOH models with some aggregated Fe and V atoms beget lower formation energy and higher OER activity than the models with isolated Fe and V atoms (vide infra), a Ni–O–Fe–O–V–O–Ni unit (Fig. 4g) is used to dissect the electronic interaction of Ni, Fe, and V cations in Ni3Fe0.5V0.5. For Ni3Fe, the three unpaired electrons in the π-symmetry (t2g) d-orbitals of Fe3+ interplay with the bridging O2− via π-donation, while the paramount interaction between the fully occupied π-symmetry (t2g) d-orbitals of Ni2+ and the bridging O2− is electron–electron repulsion, leading to partial electron transfer from Ni2+ to Fe3+ (refs. 12,40). The partial electron transfer from π-symmetry lone pairs of the bridging O2− to V4+ and V5+ in Ni3V should subsist stronger than that from the bridging O2− to Fe3+ in Ni3Fe, as V4+ and V5+ beget rather low t2g occupancy while Fe3+ has a half t2g occupancy. As for the Fe/V co-doped Ni(OH)2 with some of the V and Fe atoms aggregated in the host lattices, when Fe3+ accepts partial electrons from Ni2+ through the bridging O2− via π-donation as exampled by the NiFe (oxy)hydroxide reference, the electron-riched t2gd-orbitals of Fe3+ could relay electrons to the strongly electron-deficient t2gd-orbitals of V4+ and V5+ through the bridging O2− ions between them, which leads to better delocalization of the π-symmetry electrons among Ni, Fe, and V in the host matrix. This controversy is in kindly agreement with the XPS and soft XANES results. In Ni3Fe1−xVx, the Fe3+ and Ni2+ with half-full eg orbitals would beget very feeble bonding with adsorbed oxygen species, whereas the V4+ and V5+ with eg0 orbitals would form too stalwart bonding with adsorbed oxygen species. To salvage elevated OER activity, the bonding force between transition metal and adsorbed oxygen species should subsist optimized to fulfill the Sabatier principle47. With expand of the electron density on V by partial electron transfer from Fe and Ni to V through the bridging O2− ions, the elevated valence states of V could subsist stabilized under OER conditions, and more importantly, the stalwart bond force between V and adsorbed oxygen species could subsist tuned to a temper bond strength, which would benefit for releasing O2 from the V site in OER.

    Evaluating the electrochemical OER performance of Ni3Fe1−xVx

    The electrocatalytic OER performance of Ni3Fe1−xVx/CFP were studied in O2-saturated 1 M KOH. The linear sweep voltammograms (LSVs, Fig. 5a) of total as-prepared Ni-based (oxy)hydroxide catalysts demonstrate the Ni2+/Ni3+ oxidation in the potential compass of 1.33–1.42 V (all potentials are versus reversible hydrogen electrode (RHE))5,7,43.

    Fig. 5

    Electrochemical tests for OER and Nyquist plots of the Ni-based (oxy)hydroxide catalysts. a LSV curves of Ni3Fe1−xVx and sheer Ni (oxy)hydroxide catalysts on CFP, as well as bare CFP in O2-saturated 1 M KOH at a scan rate of 5 mV s−1. b Tafel plots derived from the polarization curves in a. c Chronopotentiometric curves obtained with Ni3Fe0.5V0.5 at constant current densities of 10 and 100 mA cm−2. d Nyquist plots of Ni3Fe0.5V0.5, Ni3Fe, Ni3V, and Ni (oxy)hydroxides and the bare CFP at 300 mV overpotential in 1 M KOH

    Figure 5a illustrates that the electrocatalytic activity of Ni3Fe1−xVx depends largely on the co-doping flush of Fe and V atoms. Among the as-prepared Fe- or/and V-doped Ni-based binary and ternary catalysts, Ni3Fe0.5V0.5 exhibits the best OER performance, with low overpotentials of 264 and 291 mV to achieve 100 and 500 mA cm−2 current density, respectively (Supplementary Fig. 18). The LSV of Ni3Fe0.5V0.5, scanning from positive to negative direction to exclude the influence of the Ni2+/Ni3+ oxidation event on the catalytic current, shows that only 200 mV overpotential is required to attain 10 mA cm−2 current density. The OER performance of Ni3Fe0.5V0.5 is on a par with or even surpasses that of the first-class earth-abundant catalysts reported to date (Supplementary Table 7).

    Moreover, the turnover frequency (TOF, based on total amount of metals) of Ni3Fe0.5V0.5 (0.574 s−1) at η = 300 mV in 1 M KOH is significantly larger than those of Ni3Fe (0.018 s−1), Ni3V (0.097 s−1), Ni3Fe0.67V0.33 (0.116 s−1), and Ni3Fe0.33V0.67 (0.195 s−1). Figure 5b manifests that the Tafel slope of Ni3Fe0.5V0.5 (39 mV dec−1) is considerably smaller than those of Ni3Fe0.67V0.33 (59 mV dec−1), Ni3Fe0.33V0.67 (54 mV dec−1), Ni3Fe (67 mV dec−1), and Ni3V (67 mV dec−1). The apparently larger TOF value and smaller Tafel slope of Ni3Fe0.5V0.5 as compared to those of Ni3Fe and Ni3V bespeak that the synergetic effect of co-doped Fe and V plays an essential role in facilitating the kinetics of OER and enhancing the intrinsic activity.

    The stability of Ni3Fe0.5V0.5 was assessed by repeated cyclic voltammetry scanning, multi-current step test, and long-term chronopotentiometric experiments. After being subjected to 4000 CV cycles, the OER polarization curve of Ni3Fe0.5V0.5 almost overlaps with the initial one (Supplementary Fig. 20a), indicating no noticeable loss in catalytic current, and thus, the kindly accelerated stability of the electrode. Supplementary Fig. 20b shows the E–t plot of two cycles of multi-current step curves for Ni3Fe0.5V0.5 with current density being enhanced from 50 to 500 mA cm−2 by five steps. In each step, once a inevitable current density is set, the potential promptly levels off and maintains constant for 500 s; the multi-current step curve is well repeated in the subsequent cycle. This observation signifies relish a flash mass transportation and kindly electronic conductivity of the 3D Ni3Fe0.5V0.5/CFP matrix13. Additionally, the Ni3Fe0.5V0.5/CFP electrode displays kindly stability at fixed current densities of 10 and 100 mA cm−2, respectively, over 60 h of electrolysis (Fig. 5c), indicating excellent stability of the electrode under testing conditions. The Faradaic efficiency of Ni3Fe0.5V0.5 evaluated from a chronopotentiometric experiment at a constant current density of 10 mA cm−2 for 2 h is nearby to 100% (Supplementary Fig. 21).

    To beget a general understanding on the superior activity of Ni3Fe0.5V0.5, they estimated the roughness factors (RF) and measured the electrochemical impedance spectroscopy (EIS) of total as-prepared Ni-based electrodes. Based on the estimated RF values (Supplementary Fig. 22 and Supplementary Note 2), the OER polarization curves of Ni3Fe1−xVx were ploted with J normalized by RF values (Supplementary Fig. 23) to evaluate the improvement of intrinsic OER activity for the Ni-based (oxy)hydroxides with different Fe and V doping levels3. The specific current density (Js = 61.6 mA cm−2) of Ni3Fe0.5V0.5 at 300 mV overpotential is about 3, 16, and 71 times higher than those of Ni3V, Ni3Fe, and sheer Ni (oxy)hydroxides, respectively, which reveals that the co-doping of Fe and V into Ni(OH)2 lattices is much more efficient than separately doping Fe or V for improving the specific activity of Ni-based catalysts, and the improved specific activity contributed largely to the elevated OER activity of Ni3Fe0.5V0.5. The Nyquist plots (Fig. 5d) are fitted to a simplified Randles equivalent circuit model (Supplementary Note 3). The very little semicircles in the elevated frequency zone are attributed to the internal charge-transfer resistances (Rct(int)) of electrodes, and the second semicircles delineate the charge-transfer resistances (Rct(s–l)) at the electrode/electrolyte interface. Both Rct(int) and Rct(s–l) values apparently decreased as Fe and V were co-doped into Ni(OH)2 lattices. The total charge-transfer resistances (Rct) measured at 300 mV overpotential are 4.2, 7.2, 10.0, and 17.2 Ω for the CFP-supported Ni3Fe0.5V0.5, Ni3V, Ni3Fe, and sheer Ni (oxy)hydroxides, respectively (Supplementary Table 9). The excellent charge-transfer capability of Ni3Fe0.5V0.5 makes a crucial contribution to the superior intrinsic OER activity of the electrode48.

    In-situ EC-Raman/XAS studies and speculative calculations

    To beget an in-depth insight into the origin of elevated activity of the Fe/V co-doped Ni(OH)2, the changes in electronic structures and local atomic environments of Ni3Fe0.5V0.5 under OER conditions were studied by in-situ electrochemical Raman (EC-Raman) spectroscopy and in-situ XAS. The measurements of in-situ EC-Raman spectra were carried out at the potential compass of 1.0–1.8 V in a spectroelectrochemical (PEC) cell filled with 1 M KOH electrolyte (Fig. 6a). When the applied potential was higher than 1.4 V, a pair of well-defined Raman peaks at around 470 and 550 cm−1 appeared, which were correlated respectively with the eg bending and the A1g stretching vibration of Ni–O in the NiOOH-type phase49,50. On the basis of EC-Raman spectra, the host facet of NiIII–OOH, formed during the OER process, could provide an electrically conductive, chemically stable, and electrolyte-permeable framework for the Fe and V dopants48,51, which would benefit the electrochemical OER.

    Fig. 6

    In-situ EC-Raman and arduous XAS spectra. a In-situ EC-Raman spectra of Ni3Fe0.5V0.5 at the potentials of 1.0–1.8 V in 1 M KOH. b, d, f In-situ Ni, Fe, and V K-edge XANES spectra at the potentials of 1.15–1.75 V. c, e, g FT curves of Ni, Fe, and V K-edge EXAFS k2χ(k) functions obtained from the XANES spectra in b, d, f, respectively. The orange and pink circles delineate the fitting values

    Furthermore, the alteration in the local coordination environment of Ni–O/Fe–O/V–O units and the indifferent oxidation states of Ni, Fe, and V centers in Ni3Fe0.5V0.5 were investigated by in-situ arduous XAS (Supplementary Fig. 24). The in-situ Ni K-edge XANES spectra (Fig. 6b) demonstrate that the Ni absorption-edge and the white-line are gradually shifted to the higher-energy side as the applied potential is increased from 1.15 to 1.75 V. Accordingly, the Ni–O distance is shortened from 2.04 Å at 1.15 V to 1.90 Å at 1.75 V (Fig. 6c and Supplementary Table 8). The former is nearby to the Ni–O bond length (2.05 Å) in Ni(OH)2, and the latter is almost identical with the Ni–O bond length (1.88 Å) in NiOOH, which contains a compund of Ni3+ and Ni4+ sites10. This is in line with the results of in-situ EC-Raman spectroscopy. A similar shift of the Fe white-line peak toward the higher-energy side is besides observed with increasing applied potential (Fig. 6d), and the Fe–O distance is shortened slightly from 2.00 Å at 1.15 V to 1.97 Å at 1.75 V (Fig. 6e and Supplementary Table 8), signifying that the oxidation status of Fe is increased from +3 to nearly +4 during the OER electrolysis process of Ni3Fe0.5V0.5. These FT-EXAFS fortunate results of Ni and Fe K-edges of Ni3Fe0.5V0.5 in both comfort and activated states are consistent with the previous reports10,14. More interestingly, with increasing the applied potential from 1.15 to 1.75 V, the pre-edge peak is slightly decreased in intensity in the in-situ V K-edge XANES spectrum (inset of Fig. 6f), however, it shows identical spectral features to those measured before OER. Similarly, except for the abate in the intensity of the characteristic peaks, no other obvious change is visible at the ex-situ V L-edge spectra (Supplementary Fig. 25) after OER measurement at 1.75 V. This evidence suggests partial electron transfer to the V 3d orbitals, as their peak intensity is proportional to the unoccupied density of 3d states. Meanwhile, the V–O1 distance is besides shrunk from 1.70 Å at 1.15 V to 1.65 Å at 1.75 V (Fig. 6g and Supplementary Table 8), which is nearby to that of the shortest V–O bond length reported for V5+ oxides (1.59 Å) while much shorter than that reported for V4+ oxides (1.76 Å)42. The V atoms with such a short V–O bond may beget optimal binding capability with oxygen intermediates relative to Ni and Fe atoms, and exhibit enhanced OER activity, as will subsist illustrated by following speculative calculations. These in-situ XAS analyses manifest for the first time the contraction of M–M′ and M(M′)–O bond lengths and the short V–O bond distance in the activated V-containing (oxy)hydroxide OER catalysts.

    DFT plus Hubbard U (DFT + U) calculations were conducted to beget a speculative understanding on the evident enhancement of OER activity of the Fe/V co-doped Ni(OH)2 from atomic level. It is known that Ni(OH)2 experiences facet transformations during charging and discharging, and its oxyhydroxides are proposed to subsist the dynamic facet for OER14,52,53. Thus, they deem β-NiOOH co-doped by V and Fe atoms with the experimentally optimized doping concentration of Ni:Fe:V = 6:1:1, as well as the systems doped by only V or Fe atom with Ni:V (Fe) = 3:1 (Fig. 7a and Supplementary Fig. 26). The model surfaces are covered by either water molecules or oxygen species that are possibly present in the reaction media. These models with different covered species give very similar results on the catalytic properties (Fig. 7c and Supplementary Table 6).

    Fig. 7

    DFT speculative models. a Side views of the Fe/V co-doped Ni (oxy)hydroxide model for DFT calculations, whose (101) surface is exposed for OER catalysis. b Structures and BEs of an OH*, O*, and OOH* intermediates adsorbed on the V site of the model in a with the lowest OER overpotential of 0.25 V. The surface metal atoms are covered by O species. c Volcano plot of OER overpotential versus BE contrast between OH* and O* species for various sites of Ni3Fe1−xVx (oxy)hydroxide models. For each kind of reaction site, various structural models are considered, whose particular information is given in Supplementary Fig. 28 and Supplementary Table 6. The dashed line is a guide for eyes. d Left panel: DOS of the model in a and the projected DOS on s, p, and d orbitals. right panel: projected DOS on the 3d orbitals of Ni, Fe, and V atoms in the model. The dashed lines delineate the d-band center for each element. The Fermi flush is shifted to zero. e Calculated free-energy diagram of OER on the most dynamic site of Ni3Fe0.5V0.5 (oxy)hydroxide in pH 14 solutions at different potentials (T = 298 K). The two-way arrow indicates the overpotential of the rate-limiting step

    In the optimized models, the bond lengths between metals and oxygen intermediates are 1.60–1.84, 1.63–1.95, and 1.77–2.05 Å for V, Fe, and Ni, respectively, which are in kindly agreement with the trend of experimental XAS results. The divide bond length between O atom and V, Fe, or Ni constituent is a reflection of their different bond order and bond strength, which is fundamentally governed by the electronic troop structure of the material. As revealed by the density of states (DOS) in Fig. 7d, the V, Fe, and Ni atoms in the co-doped Ni(OH)2 beget the d-band center of 0.09, −2.55, and −2.78 eV, respectively. On the basis of the d-band theory54, the V atoms with higher d-band center possess less occupancy of the antibonding states with adsorbed oxygen intermediates, and thus exhibit optimal binding with admiration to Ni and Fe atoms (Fig. 7c).

    Mulliken permeate analysis55 shows partial charges of ~1.6, 1.0, and 0.8e on the V, Fe, and Ni sites, respectively, signifying the stronger metallicity of V atoms and higher chemical activity. Although DFT calculations cannot identify the exact valence for each metal in multi-metal materials, the trend of the partial charges on the V, Fe, and Ni sites obtained from Mulliken permeate analysis is consistent with that of the valences of V4+/5+, Fe3+, and Ni2+ estimated on the basis of XANES and XPS. Moreover, the Ni (oxy)hydroxide systems without V doping are half-metal (Supplementary Fig. 27), while the V doping induces finite DOS for the spin-down states near the Fermi flush (Fig. 7d), which may abet help the electrical conductivity of the material.

    In the previously reported mechanism for 3d metal-based (oxy)hydroxide catalysts in alkaline media, the OER undergoes through following four elementary steps56,57:

    $$^\ast + {\mathrm{OH}}^ - \to {\mathrm{OH}} ^\ast {\mathrm{ + }}e^ -$$

    (1)

    $${\mathrm{OH}} ^\ast {\mathrm{ + OH}}^ - \to {\mathrm{O}} ^\ast + {\mathrm{H}}_2{\mathrm{O}}\left({\mathrm{l}} \right) + e^ -$$

    (2)

    $${\mathrm{O}} ^\ast + {\mathrm{OH}}^ - \to {\mathrm{OOH}} ^\ast + e^ -$$

    (3)

    $${\mathrm{OOH}} ^\ast + {\mathrm{OH}}^ - \to ^\ast + {\mathrm{O}}_2\left( {\mathrm{g}} \right) + {\mathrm{H}}_2{\mathrm{O}}\left({\mathrm{l}} \right) + e^ -$$

    (4)

    where * represents an dynamic site on the ferment surface; OH*, O*, and OOH* are the oxygen intermediates. To evaluate the OER activity of the Fe and/or V doped or sheer Ni (oxy)hydroxide systems, they computed the BEs of oxygen intermediates on various metal sites. The Gibbs free energy for each reaction step and speculative OER overpotentials were calculated with the yardstick hydrogen electrode (SHE) method58.

    As displayed by Fig. 7c, the OER overpotentials of doped Ni (oxy)hydroxides succeed a volcano-shape relation with the subsist contrast between OH* and O* (or OOH*) species59. In particular, oxygen binding on the Fe and Ni sites is relatively weak, i.e. EOH* > 1.15 eV and EO*–EOH* > 2.24 eV. As a consequence, formation of OH* and O* species encounters great potential barriers (Supplementary Fig. 29a, b) and will limit the reaction rate of OER process. great overpotentials of 0.72–0.79 and 0.84–1.08 V are obtained for the Fe and Ni sites, respectively, indicating their low activity for OER. By contrast, the V sites provide much stronger but temper oxygen binding force (EOH* = 0.47–0.79 eV and EO*–EOH* = 1.61–2.23 eV) and give near-optimal BEs of OER intermediates. Reactions to the formation of OH* and O* species are readily accessible, while formation of OOH* experiences the largest potential barrier and limits the OER rate, giving overpotentials of 0.25–0.63 V, which are much lower than those for Ni and Fe sites. Therefore, the highest activity is predicted on the V site of the co-doped Ni (oxy)hydroxide with some of the V and Fe atoms aggregated (Fig. 7b). Such V sites provide stalwart OOH* binding relative to O* species, and the overpotential is even lower than that of the benchmark ferment RuO2, i.e., 0.40 V for the (110) surface according to their calculations. The origin of overpotentials is clearly revealed by the free-energy diagrams as shown in Fig. 7e and Supplementary Fig. 29. The largest potential step at the equilibrium potential (U = 0.402 V) indicates the rate-limiting step (RLS) and corresponding overpotential, by overcoming which total the OER steps become downhill and thus can occur spontaneously from the thermodynamic point of view (Supplementary Note 4). In general, the speculative OER overpotentials succeed the very trend as the experimental values: Fe/V co-doped < V-doped < Fe-doped < undoped Ni (oxy)hydroxide (Supplementary Fig. 28 and Supplementary Table 6). DFT calculations demonstrate that the OER activity of V sites doped in Ni3Fe0.5V0.5 was greatly enhanced by the surrounding Ni/Fe next-nearest neighbors, and more importantly, the (Ni3Fe0.5V0.5)-OOH models with some of Fe and V atoms aggregated in NiOOH lattices beget lower formation energy and higher OER activity than the models with isolated Fe and V atoms. This inference is disagree with the statement made by Bell and Calle-Vallejo et al. that for Fe-doped Ni (oxy)hydroxides the surrounding Ni neighbors expand the activity of Fe sites10,60,61.


    Software Design Document, Testing, Deployment and Configuration Management of the UUIS--a Team 2 COMP5541-W10 Project Approach | killexams.com existent questions and Pass4sure dumps

    SDD for UUIS TEAM 2 2010

    92

    (7, 'demo1', 'DEMO0001', 5555555, '1000demo', 2, 0, 1, '0000-00-00

    00:00:00', 'inactive'),

    (8, 'demo2', 'DEMO0001', 576, '2000demo', 2, 0, 3, '2010-05-02 19:50:24',

    'stolen'),

    (9, 'demo3', 'DEMO0003', 0, '3000demo', 2, 0, 1, '0000-00-00 00:00:00',

    'inactive'),

    (10, 'demo4', 'DEMO0004', 0, '4000demo', 2, 0, 3, '0000-00-00 00:00:00',

    'inactive'),

    (11, 'demo5', 'DEMO0005', 2147483647, '5000demo', 2, 0, 3, '2010-05-02

    20:14:13', 'active'),

    (12, 'demo6', 'DEMO0006', 2147483647, '6000demo', 2, 0, 1, '0000-00-00

    00:00:00', 'inactive'),

    (13, 'demo7', 'DEMO0007', 0, '7000demo', 2, 0, 2, '0000-00-00 00:00:00',

    'stolen'),

    (14, 'demo8', 'DEMO0008', 0, '8000demo', 2, 0, 2, '0000-00-00 00:00:00',

    'stolen'),

    (15, 'demo10', 'DEMO00010', 0, '10000demo', 2, 0, 2, '0000-00-00

    00:00:00', 'stolen'),

    (16, 'demo3', 'DEMO0003', 0, '3000demo', 2, 0, 2, '0000-00-00 00:00:00',

    'stolen'),

    (17, '3333333333', '333333333', 2147483647, '33333333', 1, 333333, 2,

    '0000-00-00 00:00:00', 'stolen'),

    (18, 'qqqqq', 'qqqqq', 0, 'qqqq', 1, 0, 1, '0000-00-00 00:00:00', 'active'),

    (19, '', '', 0, ' ', 0, 0, 0, '0000-00-00 00:00:00', ''),

    (20, 'Dell tower 1', 'UUIS000002', NULL, 'a0002', 1, 3, 3, '2010-05-02

    13:37:34', NULL),

    (21, 'Dell tower 2', 'UUIS000003', NULL, 'a0003', 1, 21, 4, '2010-05-02

    13:37:34', NULL),

    (22, 'Dell tower 3', 'UUIS000004', NULL, 'a0004', 1, 20, 5, '2010-05-02

    13:37:34', NULL),

    (23, 'Marker', 'UUIS000005', NULL, 'a0005', 3, 21, 6, '2010-05-02

    13:37:34', NULL),

    (24, '66666', '66666', 66666, '666666 ', 2, 6666, 4, '0000-00-00

    00:00:00', 'active'),

    (25, 'uuuu', 'uuuu', 0, 'uuuu ', 1, 0, 1, '0000-00-00 00:00:00',

    'active'),

    (27, '999', '999', 999, '999', 1, 999, 2, '0000-00-00 00:00:00', 'lent'),

    (28, '22222', '22222', 22222, '22 ', 1, 222222, 2, '0000-00-00 00:00:00',

    'inactive'),

    (29, '', '', 0, ' ', 0, 0, 2, '0000-00-00 00:00:00', ''),

    (30, '', '', 0, '2222DEMO', 0, 0, 0, '0000-00-00 00:00:00', ''),

    (31, 'Table1', '', 0, '11111DEMO', 1, 0, 2, '0000-00-00 00:00:00', 'active'),


    About using Nix in my evolution workflow | killexams.com existent questions and Pass4sure dumps

    Two years ago, whenever I needed to utilize some language or implement which wasn’t available on my machine, I would beget used the system’s package manager to install it. It worked on my computer, but when I needed to reproduce the setup elsewhere it was another story. I was quiet a student then.

    I recall a group project in which they were using Node.js. I had a recent version installed on my Mac via Homebrew, while at the university and on other student’s computer based on Ubuntu Linux, it was installed from the default repos. Then, my code using default parameters in functions would sprint on my machine but not on other’s, since their Node.js version was greatly outdated.

    Using this approach can quickly become a nightmare, especially when you try to write a documentation on how to set up the evolution environment. You finish up writing things like: “If you are on macOS gladden execute this, on Debian execute that, and Fedora sprint this other command.” You can verify it works now, but there is no guarantee it will quiet travail in a few months.

    asdf

    At the finish of my studies, while starting my internship, I started to execute a lot more software evolution at home. Mainly because I didn’t beget to worry anymore about not doing my homework. This is back then I discovered Elixir and started to build up my workflow, seeking for quality, reproducibility and joy of use. With my Node.js narrative in mind, I discovered language version managers. I went for asdf as it would handle for me quite a bunch of languages, including Erlang, Elixir, Node.js and Ruby.

    If you are not confidential with it, asdf can install exactly the version you want for each language it handles through a plugin system. You can even beget multiple versions installed on the very machine and set the wanted one for every project using a .tool-versions file which looks relish this:

    erlang 21.0elixir 1.7.3-otp-21

    It is simple to use, and you can set up easily your build environment on different machines, running asdf install in a project directory.

    Yet, if the setup process is simplified, there are quiet issues:

  • after installing asdf, you exigency to install total the needed plugins. It is only a matter of asdf plugin-install <plugin-name> commands, but it is not automated;
  • some languages require dependencies to build. Erlang, for instance, needs some packages to subsist installed before asdf install erlang <version> works. You exigency a compiler, ncurses, OpenSSL and quite a few more. Setup instructions depends on the system you use;
  • If your project depends on other tools like, say, fwup for Nerves projects, you quiet beget to provide manual setup instructions.
  • This is where Nix enters the game.

    Nix

    Nix defines itself as The Purely Functional Package Manager. Having learned the advantages of Functional Programming while using Elixir and looking at Haskell and other FP languages over the past year, its concept was very tempting to me.

    Being purely functional means given an input, you always salvage the very output. That is, given a version of nixpkgs and a set of packages, you always salvage the very environment. In fact, packages are named derivations in the Nix jargon: they are functions that takes other derivations — their dependencies — as input and yield a derived result. They are built in isolation, so total dependencies must subsist explicitely stated. This ensures reproducibility.

    Nix stores total the built derivations in the Nix store, usually located at /nix/store. A very package can subsist present multiple times in the Nix store, at different versions or even at the very version but using different versions of its dependencies. Remember: a built derivation is the product of total its dependencies; if you change something, it is a different product.

    To achieve a unique naming for each derivation, a hash is computed from the set of its dependencies. You then salvage a path like:

    /nix/store/k13mm9jqxm2ndlwzsj7zicsq7lpmmjlg-elixir-1.7.3

    Unlike other package managers, Nix does not utilize the conventional /{,usr,usr/local}/{bin,sbin,lib,share,etc} directories. Instead, it uses a lot of symbolic links to create profiles. A profile is a benevolent of derivation used to setup a user environment. In a profile, you salvage a yardstick Unix tree with symbolic links to executables and configuration files stored in other derivation outputs. For instance,~/.nix-profile/bin/elixir is a symbolic link to:

    /nix/store/k13mm9jqxm2ndlwzsj7zicsq7lpmmjlg-elixir-1.7.3/bin/elixir

    Actually, ~/.nix-profile is itself a link:

    ~/.nix-profile -> /nix/var/nix/profiles/per-user/***/profile

    Which itself points to profile-56-link wich finally points to somewhere in the Nix store:

    profile-56-link -> /nix/store/5yw8dnp9908ia6sdfvx01jzis4l2hni7-user-environment

    That is, as I beget said above, a profile is a derivation. It derives from a set of packages, that themselves derive from other packages. Depends on becomes in Nix derives from. This is conceptual but you salvage the idea.

    Updating a symbolic link has the exciting property of being an atomic operation. This enables atomic transactions: when performing an upgrade, a new user-environment derivation is built, with a different hash. Then, a new generation is created for the profile — understand: a new symbolic link profile-57-link pointing to the new derivation. Then, and only then, the profile link is updated to point to profile-57-link. You’ve just performed an atomic upgrade. If things went south, you’ve besides got atomic rollbacks for free: just update again the profile link to point to profile-56-link and you are back in the past.

    Moreover, only what you asked for is made available in the environment. For instance, Elixir depends on Erlang. Erlang is then installed somewhere in the Nix store and the Elixir installation is sensible of it so it can travail correctly. But unless you explicitely asked to besides install Erlang, only Elixir binaries will subsist linked in your user environment.

    Nix as a declarative configuration manager

    Package managers usually travail in an imperative way. That is, you question them to install this, to execute an upgrade or to uninstall that. One really tidy feature of Nix is Nix, the language. It is a purely functional domain-specific language that comes with Nix.

    The primary utilize of Nix, the language, is to write derivations. Yet, different applications of Nix besides leverage the language to manage packages and configuration declaratively. In NixOS — a special GNU/Linux distribution based on Nix — , total the system configuration and globally installed packages are declared in /etc/nixos/configuration.nix. It can leer like:

    { config, pkgs, ... }: {network.hostname = "nixos-test";time.timeZone = "Europe/Paris"; # Omitting a lot of options, this is just a sample. environment.systemPackages = with pkgs; [curlgitgnupghtop...];}

    To change the status of the system, you just beget to edit the file, then question NixOS to switch to the new environment:

    # nixos-rebuild switch

    It derives a new system environment, switches to it and reloads services as needed. With this benevolent of configuration, you can easily reproduce your system setup on different machines.

    Another sample is home-manager. It aims to provide the very benevolent of declarative configuration as NixOS but at the user level. I personally utilize it to manage my dotfiles and my set of user-wide-available utilities accross different machines.

    Apart system and user environments, Nix can subsist used to setup a third benevolent of environment. Let’s talk about it.

    Nix as a reproducible environment builder

    It is neither practical nor wantable to update your system or user environment each time you exigency a particular dependency for a given project. First, the given dependency can subsist required only by a specific project: you execute not exigency to beget it available (system|user)-wide. Second, you want your environment to subsist shareable with other developers. Asking them to update their global environment with this or that requirement is not the best thing to do. This is where Nix shells enter.

    A Nix shell is a temporary environment where build inputs of a derivation are made available to the user. Let’s whisper it more simply with an example: you can create a shell.nix file at the root of your project containing something like:

    { pkgs ? import <nixpkgs> {} }: with pkgs; mkShell {buildInputs = [ ocaml git ];}

    Then, sprint the nix-shell command. You are in a Nix shell, with OCaml and Git made available to you. The shell.nix can subsist committed, thus shared between developers.

    Using Nix

    To start working on a project using Nix, the first step is to install Nix itself. From the official documentation, total you beget to execute is running:

    $ curl https://nixos.org/nix/install | sh

    There are in fact two kinds of installation for Nix:

  • the single-user installation, where /nix/store is owned by the user installing Nix. This is the simplest way to install Nix if you are the only user on your machine and don’t want to utilize Nix extensively outside of setting your evolution environment. It is besides the easiest to uninstall as you just beget to delete the /nix directory;
  • the multi-user installation, where /nix/store is owned by root and a nixbld group has write access to it. total Nix operations are then performed by nix-daemon. Different users can utilize Nix simultaneously and you gain a system environment relish on NixOS. In the multi-user installation, builds are performed by special builder users in complete isolation. It is a puny bit more intricate to manage, but this is the recommended way to install Nix if you scheme to utilize it a lot, even if you are the only user on your machine. It is supported on macOS and total Linux running systemd with SELinux disabled.
  • As far as I know, the default installer currently choses automatically the kind of installation. It could change in the near future to prompting the user for a choice. In the meantime, you can obligate how to install Nix by doing, for a single-user installation:

    $ sh <(curl https://nixos.org/nix/install) --no-daemon

    For a multi-user installation it is:

    $ sh <(curl https://nixos.org/nix/install) --daemon

    Nix being installed on you machine, you can create a shell.nix in your project:

    # This defines a office taking `pkgs` as parameter, and uses# `nixpkgs` by default if no controversy is passed to it.{ pkgs ? import <nixpkgs> {} }: # This avoids typing `pkgs.` before each package name.with pkgs; # Defines a shell.mkShell {# Sets the build inputs, i.e. what will subsist available in our# local environment.buildInputs = [ elixir git ];}

    Then, total you beget to execute is running:

    $ nix-shell

    Nix will copy or build derivations, then sprint a shell in which Elixir and Git are available. By default, the Nix shell is a bash. If you are relish me and want to withhold your kindly venerable zsh for your day-to-day environment, there is an exciting plugin for that.

    In a yardstick Nix shell, your system-wide environment is quiet available. While it is quite useful for day-to-day work, you can easily miss a dependency when first building your environment. If you want to subsist confident not to miss any dependency and ensure reproducibility, you should sprint a sheer Nix shell, that is a Nix shell where only the inputs explicitely stated in the shell.nix are available:

    $ nix-shell --pure

    You slack total your environment, total your aliases, total your usually available programs. You are in a standardised bash that will subsist the very on every machine where you sprint a sheer shell. It is not a restful situation to work, but it is really restful when your application builds in such a shell. It means any other developer or the future you will subsist able to setup the very environment and build the application as expected. But for your comfort, you can utilize a yardstick Nix shell most of the time.



    Direct Download of over 5500 Certification Exams

    3COM [8 Certification Exam(s) ]
    AccessData [1 Certification Exam(s) ]
    ACFE [1 Certification Exam(s) ]
    ACI [3 Certification Exam(s) ]
    Acme-Packet [1 Certification Exam(s) ]
    ACSM [4 Certification Exam(s) ]
    ACT [1 Certification Exam(s) ]
    Admission-Tests [13 Certification Exam(s) ]
    ADOBE [93 Certification Exam(s) ]
    AFP [1 Certification Exam(s) ]
    AICPA [2 Certification Exam(s) ]
    AIIM [1 Certification Exam(s) ]
    Alcatel-Lucent [13 Certification Exam(s) ]
    Alfresco [1 Certification Exam(s) ]
    Altiris [3 Certification Exam(s) ]
    Amazon [2 Certification Exam(s) ]
    American-College [2 Certification Exam(s) ]
    Android [4 Certification Exam(s) ]
    APA [1 Certification Exam(s) ]
    APC [2 Certification Exam(s) ]
    APICS [2 Certification Exam(s) ]
    Apple [69 Certification Exam(s) ]
    AppSense [1 Certification Exam(s) ]
    APTUSC [1 Certification Exam(s) ]
    Arizona-Education [1 Certification Exam(s) ]
    ARM [1 Certification Exam(s) ]
    Aruba [8 Certification Exam(s) ]
    ASIS [2 Certification Exam(s) ]
    ASQ [3 Certification Exam(s) ]
    ASTQB [8 Certification Exam(s) ]
    Autodesk [2 Certification Exam(s) ]
    Avaya [101 Certification Exam(s) ]
    AXELOS [1 Certification Exam(s) ]
    Axis [1 Certification Exam(s) ]
    Banking [1 Certification Exam(s) ]
    BEA [5 Certification Exam(s) ]
    BICSI [2 Certification Exam(s) ]
    BlackBerry [17 Certification Exam(s) ]
    BlueCoat [2 Certification Exam(s) ]
    Brocade [4 Certification Exam(s) ]
    Business-Objects [11 Certification Exam(s) ]
    Business-Tests [4 Certification Exam(s) ]
    CA-Technologies [20 Certification Exam(s) ]
    Certification-Board [10 Certification Exam(s) ]
    Certiport [3 Certification Exam(s) ]
    CheckPoint [43 Certification Exam(s) ]
    CIDQ [1 Certification Exam(s) ]
    CIPS [4 Certification Exam(s) ]
    Cisco [318 Certification Exam(s) ]
    Citrix [48 Certification Exam(s) ]
    CIW [18 Certification Exam(s) ]
    Cloudera [10 Certification Exam(s) ]
    Cognos [19 Certification Exam(s) ]
    College-Board [2 Certification Exam(s) ]
    CompTIA [76 Certification Exam(s) ]
    ComputerAssociates [6 Certification Exam(s) ]
    Consultant [2 Certification Exam(s) ]
    Counselor [4 Certification Exam(s) ]
    CPP-Institute [4 Certification Exam(s) ]
    CSP [1 Certification Exam(s) ]
    CWNA [1 Certification Exam(s) ]
    CWNP [13 Certification Exam(s) ]
    CyberArk [1 Certification Exam(s) ]
    Dassault [2 Certification Exam(s) ]
    DELL [11 Certification Exam(s) ]
    DMI [1 Certification Exam(s) ]
    DRI [1 Certification Exam(s) ]
    ECCouncil [22 Certification Exam(s) ]
    ECDL [1 Certification Exam(s) ]
    EMC [128 Certification Exam(s) ]
    Enterasys [13 Certification Exam(s) ]
    Ericsson [5 Certification Exam(s) ]
    ESPA [1 Certification Exam(s) ]
    Esri [2 Certification Exam(s) ]
    ExamExpress [15 Certification Exam(s) ]
    Exin [40 Certification Exam(s) ]
    ExtremeNetworks [3 Certification Exam(s) ]
    F5-Networks [20 Certification Exam(s) ]
    FCTC [2 Certification Exam(s) ]
    Filemaker [9 Certification Exam(s) ]
    Financial [36 Certification Exam(s) ]
    Food [4 Certification Exam(s) ]
    Fortinet [14 Certification Exam(s) ]
    Foundry [6 Certification Exam(s) ]
    FSMTB [1 Certification Exam(s) ]
    Fujitsu [2 Certification Exam(s) ]
    GAQM [9 Certification Exam(s) ]
    Genesys [4 Certification Exam(s) ]
    GIAC [15 Certification Exam(s) ]
    Google [4 Certification Exam(s) ]
    GuidanceSoftware [2 Certification Exam(s) ]
    H3C [1 Certification Exam(s) ]
    HDI [9 Certification Exam(s) ]
    Healthcare [3 Certification Exam(s) ]
    HIPAA [2 Certification Exam(s) ]
    Hitachi [30 Certification Exam(s) ]
    Hortonworks [4 Certification Exam(s) ]
    Hospitality [2 Certification Exam(s) ]
    HP [752 Certification Exam(s) ]
    HR [4 Certification Exam(s) ]
    HRCI [1 Certification Exam(s) ]
    Huawei [21 Certification Exam(s) ]
    Hyperion [10 Certification Exam(s) ]
    IAAP [1 Certification Exam(s) ]
    IAHCSMM [1 Certification Exam(s) ]
    IBM [1533 Certification Exam(s) ]
    IBQH [1 Certification Exam(s) ]
    ICAI [1 Certification Exam(s) ]
    ICDL [6 Certification Exam(s) ]
    IEEE [1 Certification Exam(s) ]
    IELTS [1 Certification Exam(s) ]
    IFPUG [1 Certification Exam(s) ]
    IIA [3 Certification Exam(s) ]
    IIBA [2 Certification Exam(s) ]
    IISFA [1 Certification Exam(s) ]
    Intel [2 Certification Exam(s) ]
    IQN [1 Certification Exam(s) ]
    IRS [1 Certification Exam(s) ]
    ISA [1 Certification Exam(s) ]
    ISACA [4 Certification Exam(s) ]
    ISC2 [6 Certification Exam(s) ]
    ISEB [24 Certification Exam(s) ]
    Isilon [4 Certification Exam(s) ]
    ISM [6 Certification Exam(s) ]
    iSQI [7 Certification Exam(s) ]
    ITEC [1 Certification Exam(s) ]
    Juniper [65 Certification Exam(s) ]
    LEED [1 Certification Exam(s) ]
    Legato [5 Certification Exam(s) ]
    Liferay [1 Certification Exam(s) ]
    Logical-Operations [1 Certification Exam(s) ]
    Lotus [66 Certification Exam(s) ]
    LPI [24 Certification Exam(s) ]
    LSI [3 Certification Exam(s) ]
    Magento [3 Certification Exam(s) ]
    Maintenance [2 Certification Exam(s) ]
    McAfee [8 Certification Exam(s) ]
    McData [3 Certification Exam(s) ]
    Medical [68 Certification Exam(s) ]
    Microsoft [375 Certification Exam(s) ]
    Mile2 [3 Certification Exam(s) ]
    Military [1 Certification Exam(s) ]
    Misc [1 Certification Exam(s) ]
    Motorola [7 Certification Exam(s) ]
    mySQL [4 Certification Exam(s) ]
    NBSTSA [1 Certification Exam(s) ]
    NCEES [2 Certification Exam(s) ]
    NCIDQ [1 Certification Exam(s) ]
    NCLEX [3 Certification Exam(s) ]
    Network-General [12 Certification Exam(s) ]
    NetworkAppliance [39 Certification Exam(s) ]
    NI [1 Certification Exam(s) ]
    NIELIT [1 Certification Exam(s) ]
    Nokia [6 Certification Exam(s) ]
    Nortel [130 Certification Exam(s) ]
    Novell [37 Certification Exam(s) ]
    OMG [10 Certification Exam(s) ]
    Oracle [282 Certification Exam(s) ]
    P&C [2 Certification Exam(s) ]
    Palo-Alto [4 Certification Exam(s) ]
    PARCC [1 Certification Exam(s) ]
    PayPal [1 Certification Exam(s) ]
    Pegasystems [12 Certification Exam(s) ]
    PEOPLECERT [4 Certification Exam(s) ]
    PMI [15 Certification Exam(s) ]
    Polycom [2 Certification Exam(s) ]
    PostgreSQL-CE [1 Certification Exam(s) ]
    Prince2 [6 Certification Exam(s) ]
    PRMIA [1 Certification Exam(s) ]
    PsychCorp [1 Certification Exam(s) ]
    PTCB [2 Certification Exam(s) ]
    QAI [1 Certification Exam(s) ]
    QlikView [1 Certification Exam(s) ]
    Quality-Assurance [7 Certification Exam(s) ]
    RACC [1 Certification Exam(s) ]
    Real Estate [1 Certification Exam(s) ]
    Real-Estate [1 Certification Exam(s) ]
    RedHat [8 Certification Exam(s) ]
    RES [5 Certification Exam(s) ]
    Riverbed [8 Certification Exam(s) ]
    RSA [15 Certification Exam(s) ]
    Sair [8 Certification Exam(s) ]
    Salesforce [5 Certification Exam(s) ]
    SANS [1 Certification Exam(s) ]
    SAP [98 Certification Exam(s) ]
    SASInstitute [15 Certification Exam(s) ]
    SAT [1 Certification Exam(s) ]
    SCO [10 Certification Exam(s) ]
    SCP [6 Certification Exam(s) ]
    SDI [3 Certification Exam(s) ]
    See-Beyond [1 Certification Exam(s) ]
    Siemens [1 Certification Exam(s) ]
    Snia [7 Certification Exam(s) ]
    SOA [15 Certification Exam(s) ]
    Social-Work-Board [4 Certification Exam(s) ]
    SpringSource [1 Certification Exam(s) ]
    SUN [63 Certification Exam(s) ]
    SUSE [1 Certification Exam(s) ]
    Sybase [17 Certification Exam(s) ]
    Symantec [135 Certification Exam(s) ]
    Teacher-Certification [4 Certification Exam(s) ]
    The-Open-Group [8 Certification Exam(s) ]
    TIA [3 Certification Exam(s) ]
    Tibco [18 Certification Exam(s) ]
    Trainers [3 Certification Exam(s) ]
    Trend [1 Certification Exam(s) ]
    TruSecure [1 Certification Exam(s) ]
    USMLE [1 Certification Exam(s) ]
    VCE [6 Certification Exam(s) ]
    Veeam [2 Certification Exam(s) ]
    Veritas [33 Certification Exam(s) ]
    Vmware [58 Certification Exam(s) ]
    Wonderlic [2 Certification Exam(s) ]
    Worldatwork [2 Certification Exam(s) ]
    XML-Master [3 Certification Exam(s) ]
    Zend [6 Certification Exam(s) ]





    References :


    Dropmark : http://killexams.dropmark.com/367904/11588948
    Wordpress : http://wp.me/p7SJ6L-Wf
    Issu : https://issuu.com/trutrainers/docs/920-345
    Dropmark-Text : http://killexams.dropmark.com/367904/12129187
    Blogspot : http://killexamsbraindump.blogspot.com/2017/11/ensure-your-success-with-this-920-345.html
    weSRCH : https://www.wesrch.com/business/prpdfBU1HWO000QPVT
    publitas.com : https://view.publitas.com/trutrainers-inc/looking-for-920-345-exam-dumps-that-works-in-real-exam
    Calameo : http://en.calameo.com/books/004923526d1ac135174d7
    Box.net : https://app.box.com/s/t9kay0e3vaqplygyp74eh44gjss5cy4o
    zoho.com : https://docs.zoho.com/file/5qop5b1d987c12df1481e8595978df371b500






    Back to Main Page





    Killexams 920-345 exams | Killexams 920-345 cert | Pass4Sure 920-345 questions | Pass4sure 920-345 | pass-guaratee 920-345 | best 920-345 test preparation | best 920-345 training guides | 920-345 examcollection | killexams | killexams 920-345 review | killexams 920-345 legit | kill 920-345 example | kill 920-345 example journalism | kill exams 920-345 reviews | kill exam ripoff report | review 920-345 | review 920-345 quizlet | review 920-345 login | review 920-345 archives | review 920-345 sheet | legitimate 920-345 | legit 920-345 | legitimacy 920-345 | legitimation 920-345 | legit 920-345 check | legitimate 920-345 program | legitimize 920-345 | legitimate 920-345 business | legitimate 920-345 definition | legit 920-345 site | legit online banking | legit 920-345 website | legitimacy 920-345 definition | >pass 4 sure | pass for sure | p4s | pass4sure certification | pass4sure exam | IT certification | IT Exam | 920-345 material provider | pass4sure login | pass4sure 920-345 exams | pass4sure 920-345 reviews | pass4sure aws | pass4sure 920-345 security | pass4sure cisco | pass4sure coupon | pass4sure 920-345 dumps | pass4sure cissp | pass4sure 920-345 braindumps | pass4sure 920-345 test | pass4sure 920-345 torrent | pass4sure 920-345 download | pass4surekey | pass4sure cap | pass4sure free | examsoft | examsoft login | exams | exams free | examsolutions | exams4pilots | examsoft download | exams questions | examslocal | exams practice |

    www.pass4surez.com | www.killcerts.com | www.search4exams.com | http://morganstudioonline.com/


    <

    MORGAN Studio

    is specialized in Architectural visualization , Industrial visualization , 3D Modeling ,3D Animation , Entertainment and Visual Effects .